Solution-processed electrochromic materials offer high potential for energy-efficient smart windows and displays. Their performance varies with material choice and processing conditions. Electrochromic thin film electrodes require a smooth, defect-free coating for optimal contrast between bleached and colored states. The complexity of optimizing the spin-coated electrochromic thin layer poses challenges for rapid development. This study demonstrates the use of self-driving laboratories to accelerate the development of electrochromic coatings by coupling automation with machine learning. Our system combines automated data acquisition, image processing, spectral analysis, and Bayesian optimization to explore processing parameters efficiently. This approach not only increases throughput but also enables a pointed search for optimal processing parameters. The approach can be applied to various solution-processed materials, highlighting the potential of self-driving labs in enhancing materials discovery and process optimization.

Optical properties of thin film are greatly influenced by the thickness of each layer. Accurately predicting these thicknesses and their corresponding optical properties is important in the optical inverse design of thin films. However, traditional inverse design methods usually demand extensive numerical simulations and optimization procedures, which are time-consuming. In this paper, we utilize deep learning for the inverse design of the transmission spectra of SiO2/TiO2 multilayer thin films. We implement a tandem neural network (TNN), which can solve the one-to-many mapping problem that greatly degrades the performance of deep-learning-based inverse designs. In general, the TNN has been implemented by a back-to-back connection of an inverse neural network and a pre-trained forward neural network, both of which have been implemented based on multilayer perceptron (MLP) algorithms. In this paper, we propose to use not only MLP, but also convolutional neural network (CNN) or long short-term memory (LSTM) algorithms in the configuration of the TNN. We show that an LSTM-LSTM-based TNN yields the highest accuracy but takes the longest training time among nine configurations of TNNs. We also find that a CNN-LSTM-based TNN will be an optimal solution in terms of accuracy and speed because it could integrate the strengths of the CNN and LSTM algorithms.

Domain-wall dynamics in ferroelectric materials are strongly position-dependent since each polar interface is locked into a unique local microstructure. This necessitates spatially resolved studies of the wall-pinning using scanning-probe microscopy techniques. The pinning centers and preexisting domain walls are usually sparse within image plane, precluding the use of dense hyperspectral imaging modes and requiring time-consuming human experimentation. Here, a large area epitaxial PbTiO$_3$ film on cubic KTaO$_3$ were investigated to quantify the electric field driven dynamics of the polar-strain domain structures using ML-controlled automated Piezoresponse Force Microscopy. Analysis of 1500 switching events reveals that domain wall displacement depends not only on field parameters but also on the local ferroelectric-ferroelastic configuration. For example, twin boundaries in polydomains regions like a$_1^-$/$c^+$ $\parallel$ a$_2^-$/$c^-$ stay pinned up to a certain level of bias magnitude and change only marginally as the bias increases from 20V to 30V, whereas single variant boundaries like a$_2^+$/$c^+$ $\parallel$ a$_2^-$/$c^-$ stack are already activated at 20V. These statistics on the possible ferroelectric and ferroelastic wall orientations, together with the automated, high-throughput AFM workflow, can be distilled into a predictive map that links domain configurations to pulse parameters. This microstructure-specific rule set forms the foundation for designing ferroelectric memories.

In material physics, characterization techniques are foremost crucial for obtaining the materials data regarding the physical properties as well as structural, electronics, magnetic, optic, dielectric, and spectroscopic characteristics. However, for many materials, ensuring availability and safe accessibility is not always easy and fully warranted. Moreover, the use of modeling and simulation techniques need a lot of theoretical knowledge, in addition of being associated to costly computation time and a great complexity deal. Thus, analyzing materials with different techniques for multiple samples simultaneously, still be very challenging for engineers and researchers. It is worth noting that although of being very risky, X-ray diffraction is the well known and widely used characterization technique which gathers data from structural properties of crystalline 1d, 2d or 3d materials. We propose in this paper, a Smart GRU for Gated Recurrent Unit model to forcast structural characteristics or properties of thin films of tin oxide SnO$_2$(110). Indeed, thin films samples are elaborated and managed experimentally and the collected data dictionary is then used to generate an AI -- Artificial Intelligence -- GRU model for the thin films of tin oxide SnO$_2$(110) structural property characterization.

Ellipsometry is used to indirectly measure the optical properties and thickness of thin films. However, solving the inverse problem of ellipsometry is time-consuming since it involves human expertise to apply the data fitting techniques. Many studies use traditional machine learning-based methods to model the complex mathematical fitting process. In our work, we approach this problem from a deep learning perspective. First, we introduce a large-scale benchmark dataset to facilitate deep learning methods. The proposed dataset encompasses 98 types of thin film materials and 4 types of substrate materials, including metals, alloys, compounds, and polymers, among others. Additionally, we propose a deep learning framework that leverages residual connections and self-attention mechanisms to learn the massive data points. We also introduce a reconstruction loss to address the common challenge of multiple solutions in thin film thickness prediction. Compared to traditional machine learning methods, our framework achieves state-of-the-art (SOTA) performance on our proposed dataset. The dataset and code will be available upon acceptance.

We introduce a Bayesian optimization approach to guide the sputter deposition of molybdenum thin films, aiming to achieve desired residual stress and sheet resistance while minimizing susceptibility to stochastic fluctuations during deposition. Thin films are pivotal in numerous technologies, including semiconductors and optical devices, where their properties are critical. Sputter deposition parameters, such as deposition power, vacuum chamber pressure, and working distance, influence physical properties like residual stress and resistance. Excessive stress and high resistance can impair device performance, necessitating the selection of optimal process parameters. Furthermore, these parameters should ensure the consistency and reliability of thin film properties, assisting in the reproducibility of the devices. However, exploring the multidimensional design space for process optimization is expensive. Bayesian optimization is ideal for optimizing inputs/parameters of general black-box functions without reliance on gradient information. We utilize Bayesian optimization to optimize deposition power and pressure using a custom-built objective function incorporating observed stress and resistance data. Additionally, we integrate prior knowledge of stress variation with pressure into the objective function to prioritize films least affected by stochastic variations. Our findings demonstrate that Bayesian optimization effectively explores the design space and identifies optimal parameter combinations meeting desired stress and resistance specifications.

Artificial intelligence and machine-learning (AI/ML) methods are growing in sophistication and capability. The application of these methods to the physical sciences is correspondingly seeing enormous growth.[1] Recent years have seen the convergence of several new trends. Generative AI seeks to create novel outputs that conform to the structure of training data,[2, 3] for instance enabling image synthesis[4-6] or text generation. Large language models (LLMs) are generative neural networks trained on text completion, but which can be used for a variety of tasks, including sentiment analysis, code completion, document generation, or for interactive chatbots that respond to users in natural language.[7] The most successful implementations of this concept--such as the generative pre-trained transformer (GPT)[8]-- exploit the transformer architecture,[9] which has a self-attention mechanism, allowing the model to weigh the relevance of each input in a sequence and capture the contextual dependencies between words regardless of their distance from each other in the text sequence. LLMs are part of a general trend in ML towards foundation models--extensive training of large deep neural networks on enormous datasets in a task-agnostic manner.[7,

Autonomous experimentation has emerged as an efficient approach to accelerate the pace of materials discovery. Although instruments for autonomous synthesis have become popular in molecular and polymer science, solution processing of hybrid materials and nanoparticles, examples of autonomous tools for physical vapor deposition are scarce yet important for the semiconductor industry. Here, we report the design and implementation of an autonomous workflow for sputter deposition of thin films with controlled composition, leveraging a highly automated sputtering reactor custom-controlled by Python, optical emission spectroscopy (OES), and a Bayesian optimization algorithm. We modeled film composition, measured by x-ray fluorescence, as a linear function of emission lines monitored during the co-sputtering from elemental Zn and Ti targets in N$_2$ atmosphere. A Bayesian control algorithm, informed by OES, navigates the space of sputtering power to fabricate films with user-defined composition, by minimizing the absolute error between desired and measured emission signals. We validated our approach by autonomously fabricating Zn$_x$Ti$_{1-x}$N$_y$ films with deviations from the targeted cation composition within relative 3.5 %, even for 15 nm thin films, demonstrating that the proposed approach can reliably synthesize thin films with specific composition and minimal human interference. Moreover, the proposed method can be extended to more difficult synthesis experiments where plasma intensity depends non-linearly on pressure, or the elemental sticking coefficients strongly depend on the substrate temperature.

From Real-space imaging of polar and elastic nano-textures in thin films via inversion of diffraction data, reproduced under a CC BY 4.0 licence. Using a combination of high-powered X-rays, phase-retrieval algorithms and machine learning, researchers revealed the intricate nanotextures in thin-film materials, offering scientists a new, streamlined approach to analyzing potential candidates for quantum computing and microelectronics, among other applications. Scientists are especially interested in nanotextures that are distributed non-uniformly throughout a thin film because they can give the material novel properties. The most effective way to study the nanotextures is to visualize them directly, a challenge that typically requires complex electron microscopy and does not preserve the sample. The new imaging technique overcomes these challenges by using phase retrieval and machine learning to invert conventionally-collected X-ray diffraction data – such as that produced at the Cornell High Energy Synchrotron Source, where data for the study was collected – into real-space visualization of the material at the nanoscale.

Transfer learning increasingly becomes an important tool in handling data scarcity often encountered in machine learning. In the application of high-throughput thickness as a downstream process of the high-throughput optimization of optoelectronic thin films with autonomous workflows, data scarcity occurs especially for new materials. To achieve high-throughput thickness characterization, we propose a machine learning model called thicknessML that predicts thickness from UV-Vis spectrophotometry input and an overarching transfer learning workflow. We demonstrate the transfer learning workflow from generic source domain of generic band-gapped materials to specific target domain of perovskite materials, where the target domain data only come from limited number (18) of refractive indices from literature. The target domain can be easily extended to other material classes with a few literature data. Defining thickness prediction accuracy to be within-10% deviation, thicknessML achieves 92.2% (with a deviation of 3.6%) accuracy with transfer learning compared to 81.8% (with a deviation of 3.6%) 11.7% without (lower mean and larger standard deviation). Experimental validation on six deposited perovskite films also corroborates the efficacy of the proposed workflow by yielding a 10.5% mean absolute percentage error (MAPE).